Growth Properties of Carbon Nanowalls on Nickel and Titanium Interlayers.

May Tran Thi,Hyunil Kang,Seokhun Kwon,Jung-Hyun Kim,Yong-Kyu Yoon,Wonseok Choi

doi:10.3390/molecules27020406

May Tran Thi, Hyunil Kang + Show 4 more

Open Access

https://doi.org/10.3390/molecules27020406

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Abstract

This research is conducted in order to investigate the structural and electrical characteristics of carbon nanowalls (CNWs) according to the sputtering time of interlayers. The thin films were deposited through RF magnetron sputtering with a 4-inch target (Ni and Ti) on the glass substrates, and the growth times of the deposition were 5, 10, and 30 min. Then, a microwave plasma-enhanced chemical vapor deposition (PECVD) system was used to grow CNWs on the interlayer-coated glass substrates by using a mixture of H2 and CH4 gases. The FE-SEM analysis of the cross-sectional and planar images confirmed that the thickness of interlayers linearly increased according to the deposition time. Furthermore, CNWs grown on the Ni interlayer were taller and denser than those grown on the Ti interlayer. Hall measurement applied to measure sheet resistance and conductivity confirmed that the electrical efficiency improved significantly as the Ni or Ti interlayers were used. Additionally, UV-Vis spectroscopy was also used to analyze the variations in light transmittance; CNWs synthesized on Ni-coated glass have lower average transmittance than those synthesized on Ti-coated glass. Based on this experiment, it was found that the direct growth of CNW was possible on the metal layer and the CNWs synthesized on Ni interlayers showed outstanding structural and electrical characterizations than the remaining interlayer type.

Highlights

Carbon-based materials are easy to process, relatively inexpensive, chemically and structurally stable, and have high electrical conductivity [1,2,3,4]
The height of the carbon nanowalls (CNWs) changed insignificantly after the interlayers were inserted at 5 min deposition time, the average transmittance dramatically reduced to about 16.10% for the Ti interlayer and 9.2% for the Ni interlayer
The effect of the interlayers according to deposition time was investigated in order to improve the use of CNWs

Summary

Introduction

Carbon-based materials are easy to process, relatively inexpensive, chemically and structurally stable, and have high electrical conductivity [1,2,3,4]. For these reasons, they have attracted attention for a long time, and many studies on their application on semiconductors, sensors, thin films, materials, storage, and displays have been conducted [5,6,7]. Titanium is a widely used interlayer with excellent thermal stability and chemical safety, as well as a high fine hardness that can dissolve the oxides remaining on the substrate surface and act as a compliant layer that reduces shear stress at the coating– substrate interface [12,13]. The interlayer features are evaluated, and the growth characteristics of CNW grown directly on the glass substrate are compared to those of the CNW grown on the interlayer

Interlayer Deposition

Carbon Nanowall Growth

Analysis and Measurement

Findings

Conclusions