Abstract
In this paper, we investigated the effect of oxygen (02) plasma treatment on a synthesized carbon nanowall (CNW). A microwave plasma-enhanced chemical vapor deposition (PECVD) system was facilitated to grow CNWs on a glass, using a mixture of CH4 and H2 gases. First, the CNWs were post-plasma-treated for different treatment durations, and then their optical properties were analyzed. In addition, the cross-sectional and planar images of the CNWs were examined via field-emission scanning electron microscopy (FE-SEM) depending on the different post-plasma-treatment durations. Then the structural characteristics were analyzed via Raman spectroscopy, and the changes in the light transmittance depending on the O2 plasma treatment durations were analyzed using UV-Vis spectroscopy. The effects of the post-plasma treatments on the synthesized CNWs were evaluated. The results confirmed that O2 gas is effective for plasma etching of CNWs.
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