Abstract
Nonploar m-plane ZnO films were grown on p-Si (111) substrates by using atomic layer deposition. X-ray diffraction and high resolution tunneling electron microscopy measurements showed that the ZnO films were 〈101¯0〉 oriented, and the crystalline quality of ZnO films was improved with an Al2O3 buffer layer, which significantly enhances the photoluminescence and reduces the reverse leakage current of ZnO/Si heterojuction.
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