Abstract
A computational diffusion model is used to predict thickness and composition profiles of ternary InxGa1-xAs quantum wells grown by selective-area, atmospheric pressure metalorganic chemical vapor deposition (MOCVD), and its accuracy is investigated. The model utilizes diffusion equations and boundary conditions derived from basic MOCVD theory, with reaction parameters derived from experimental results, to predict the concentration of each column III constituent throughout the concentration boundary layer. Solutions to these equations are found using the two-dimensional, finite element method. The growth thickness profiles of GaAs, InP, and InxGa1-xAs deposited by selective-area MOCVD are observed by conventional profilometry, and compositions are measured indirectly by laser emission wavelengths. The data presented show that the model accurately predicts growth thickness and composition profiles of ternary III-V materials grown by selective-area MOCVD.
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