Abstract
Titanium oxide and zirconium oxide thin films were deposited at low temperatures (not exceeding 350°C) by off-plane filtered cathodic vacuum arc (FCVA). The film structures were studied by XRD and Raman spectra. For titanium oxide thin films, amorphous structure remains up to 230°C, and anatase film with the crystallite size of 16 nm is observed at 330°C as confirmed by XRD and Raman analysis. For zirconium oxide, the film structure develops from amorphous at room temperature to polycrystalline state at 150°C and above. Moreover, for the crystallized films, preferred orientation is along [-111] direction. At 150°C the films possess nano-sized crystallites (less than 15 nm). For these two kinds of metal oxide thin films, surface roughness both increases with the growth temperature.
Published Version
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