Abstract
Process conditions were established for the deposition of polycrystalline BaTiO 3 thin films on fused quartz substrates in a research-scale metalorganic chemical vapor deposition (MOCVD) system. Resulting films were studied by X-ray powder diffraction (XRD), Raman spectroscopy, energy dipersive X-ray spectroscopy, transmission electron microscopy (TEM) and secondary ion mass spectroscopy (SIMS) techniques. Films rich in Ba (molar Ba/Ti > 1) contained the second phase Ba 2TiO 4 whereas films rich in Ti were composed mainly of an amorphous phase. Cross-sectional TEM and SIMS depth profile studies of slightly Ba-rich films (that appeared to be nearly pure BaTiO 3 by XRD analysis) revealed that the films were actually composed of several layers. The multilayer structure consisted of a thin amorphous interdiffusion layer, an orthorhombic Ba 2TiO 4 layer, and a polycrystalline BaTiO 3 film containing some amorphous material. Raman spectroscopy confirmed the presence of tetragonal BaTiO 3 in the films.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a call
