Abstract
The paper reviews the principles of operation of the present sources of high intensity pulsed ion and plasma beams. Limitations of the ion beam intensity are presented. The concept of magnetic insulation is discussed in some detail. Methods of high-density plasma generation are outlined. Characteristics of the existing devices are listed. It is shown that the existing sources cover a wide range of parameters and can be matched to almost any type of experiment on material processing.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
