Abstract
Intense pulsed ion and electron beams with energies below 100 keV are difficult to create using the normal ‘‘vacuum diode.’’ In this paper, the generation of intense multiple pulsed ion and electron beams by the multiplate chamber (MPC) based on the field escalation effect is described. Various kinds of target material ions can be produced by bombardment by the electron beam created in the last gap near the anode. Studies of the propagation of intense pulsed particle beams can be conducted with such a MPC.
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