Generation and healing behavior of radiation-induced optical absorption in fluoride phosphate glasses: The dependence on UV radiation sources and temperature

Abstract

High purity fluoride phosphate (FP) glasses have a large transmission range from the vacuum ultraviolet to the infrared. They are attractive candidates for lens systems in microlithography equipment and excimer laser optics. Fluoride single crystals and vitreous silica are well-known traditional materials for ultraviolet optics. Crystal sizes are limited and glass is better for fabricating optics. For lens systems, a variety of glasses with different refractive indices and dispersion are required. The UV resonance wavelengths of FP glasses with a low content of phosphate using a two-term Sellmeier dispersion formula are comparable with those of silica and fluoride single crystals. It is known, that UV radiation induces the generation of several defect centers leading to additional absorption bands. The investigation of the kinetics of defect generation is very important for the prediction of transmission losses in case of long-time irradiation. To predict the kinetics of defect generation, first the separation of absorption bands is necessary. Experiments were carried out using UV-lamps, the KrF excimer laser (ns- and fs-pulses) and the ArF excimer laser (ns-pulses). The healing behavior of radiation-induced absorption bands was investigated using thermal treatment (temperature-dependence) and bleaching experiments (radiation-dependence). The results of these experiments enable the separation of absorption bands and the prediction of the defect generation depending on the used radiation source. The healing of strong defects at room temperature is postulated to be a diffusion-controlled process.