GaInN quantum wells grown on facets of selectively grown GaN stripes

Abstract

Multiple GaInN quantum wells (QWs) were grown on facets with reduced piezoelectric fields (PFs) of selectively grown GaN stripes oriented along the ⟨11¯00⟩ and ⟨112¯0⟩ directions by metalorganic vapor phase epitaxy. We found a higher normalized growth rate for the GaInN QWs on the {11¯01} facets compared to the {112¯2} facets and the planar grown reference sample on unstructured template. The different luminescence wavelengths observed for the QWs on these different facets can partly be explained by the reduced PFs, but additionally indicate that the In incorporation efficiency depends on the facet type. On stripes with trapezoidal cross section, we found strong interfacet migration of In and Ga changing the local thickness and composition significantly.