Abstract
TiAlMoNbWSix (x = 0, 0.3, 0.5, 0.7) HEA films were deposited by magnetron co-sputtering technology to enhance the wear and high-temperature corrosion resistance of the copper. The structure of films was regulated by changing the content of Si to improve the comprehensive properties. The lattice distortion and negative mixing enthalpy change caused by the introduction of Si transformed the film from BCC structure to amorphous. With the increase of Si content, the wear resistance and the oxidation resistance were effectively improved. The characteristic delayed diffusion effect of HEA film allowed all the TiAlMoNbWSix films to successfully block the diffusion between Zn and Cu.
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