Abstract
A surface plasmon resonant cavity capable of enhancing ultradeep subwavelength photolithography in a large area is proposed. The cavity consists of two metal films: one is etched with periodic grooves for exciting surface plasmon resonance at the metal/dielectric interface; the other below is separated by a photoresist layer. Numerical simulations show that the properties of photolithographic patterns in the cavity can be modulated by the depth of the cavity; the physical image behind the modulation is confirmed by the phase regulation of gap surface plasmons in such a system.
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