Fully unstructured Delaunay mesh generation using a modified advancing front approach for applications in technology cad

Abstract

We introduce a combination of Delaunay methods with advancing front techniques especially suitable for local regridding and semiconductor simulation applications. element quality improvement can be handled by local mesh adaptation steps. the three-dimensional meshing algorithm is suitable for complicated structures, because of its fully unstructured nature. the resulting Delaunay mesh possesses the flexibility possible within the scope of a tetrahedral representation not like octree based or other cartesian meshes which are commonly employed in technology cad (TCAD).