Frequency coupling in dual frequency capacitively coupled radio-frequency plasmas

Abstract

An industrial, confined, dual frequency, capacitively coupled, radio-frequency plasma etch reactor (Exelan®, Lam Research) has been modified for spatially resolved optical measurements. Space and phase resolved optical emission spectroscopy yields insight into the dynamics of the discharge. A strong coupling of the two frequencies is observed in the emission profiles. Consequently, the ionization dynamics, probed through excitation, is determined by both frequencies. The control of plasma density by the high frequency is, therefore, also influenced by the low frequency. Hence, separate control of plasma density and ion energy is rather complex.