Abstract
The interference of multiple counterpropagating surface plasmon waves as a lithography technique to pattern periodic two-dimensional features is proposed and illustrated in this article. The surface plasmons are generated by prism coupling method, by employing a custom made prism layer configuration and with a single exposure. 175nm periodic two-dimensional dot array patterns, with feature size as small as 93nm, have been realized using an exposure radiation of 364nm wavelength.
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More From: Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena
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