Abstract
The paper investigates the influence of the deposition temperature on the morphology and structural-phase composition of the ZnO-based substrate material with a thickness of over 50 μm during the magnetron sputtering of hot ceramic targets. The study revealed the influence of the deposition temperature on the growth rate, morphology, and structural parameters of the ZnO single crystal precipitate. It was shown that the ZnO deposition rates during the spluttering of hot ceramic targets were ultra-high (up to 1.5 μm/min). The authors propose a method for the formation of both smooth and microporous ZnO-based substrate materials without using template technologies. The results obtained in the work can be widely used in optoelectronics and nitride technologies
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