Sputtering of a hot ceramic target: Experiments with ZnO

Abstract

The sputtering of hot metal targets is a rapidly developing field in the technology of magnetron sputtering systems, aimed at solving certain challenges inherent in advancing the potential of magnetron sputtering: how to increase growth rate, the solution of a number of specific problems of reactive sputtering, and the sputtering of magnetic targets. Here the results of the sputtering of hot ZnO ceramic targets are reported for the first time. It was established that during hot sputtering the morphology of the erosion zone of a ZnO target when insulated from the thermal activity of a magnetron undergoes substantial modification at power density of P > 25 W/cm2. The hot ZnO target emits microparticles that play a major role in the process of film formation on the substrate. It was shown that the crystallization of ZnO involving microparticles in the process of magnetron sputtering of a hot target occurs through the liquid crystal mechanism. A maximum growth rate (15 nm/s) of (0001) ZnO/(0001) Al2O3 epitaxial films with high structural perfection and intense luminescence in the violet region of the spectrum was achieved (currently a record rate).