Abstract
Field emission properties of diamond-like carbon films deposited by electrodeposition technique and their dependence on the deposition parameters are reported here. Acetic acid in water was taken as the electrolytic bath. The films were compact with surface roughness varying between 45 and 85nm when the potential between the electrodes was varied between 2 and 4V. Bonding environment of carbon (sp3/sp2 ratio) was found to vary with the change in deposition parameters and post-deposition hydrogen plasma treatment. Modification of the surface with hydrogen plasma treatment culminated in sharp tip-like emission sites with associated sp3/sp2 ratio culminated in improved field emission properties in these films. Work function (φ) values obtained from the Fowler–Nordheim model varied between 40 and 90meV while the field factor (β) varied between 40 and 1740. The critical field was found to vary between 10 and 100V/μm.
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