Ferroelectric-Metal Field-Effect Transistor With Recessed Channel for 1T-DRAM Application

Abstract

The ferroelectric-metal field-effect transistor with recessed channel (RC-FeMFET) is proposed for one transistor dynamic random-access memory (1T-DRAM). Through technology computer-aided design (TCAD) simulations, the effects of inter-metal insertion on the FeFET with recessed channel (RC-FeFET) is identified. By evaluating electric field (e-field) across interlayer (IL) and memory window (MW), the improvements of program/erase cycling endurance and read current sensing margin (RSM) are verified in the RC-FeMFET. Moreover, considering program voltage (V <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">W</sub> ) and polarization switching time ( <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$\tau _{\mathrm{ p}}$ </tex-math></inline-formula> ), the guide line of the RC-FeMFET design is provided in terms of e-field across IL and MW for 1T-DRAM applications.