Abstract
This investigation evaluates the performance of a large photoreactor in degrading sulfamethazine (SMT) in aqueous solutions by the UV/H2O2 process. The effects of UV wavelength, initial H2O2 concentration, initial SMT concentration, and added anions on the efficiency of degradation of SMT were studied. The degradation of SMT proceeded more rapidly in the UV-254 nm/H2O2 process than in the UV-365 nm/H2O2 process. A higher initial H2O2 concentration was associated with more efficient degradation of SMT. However, an excessive initial H2O2 concentration limited the degradation of SMT. The efficiency of degradation of SMT increased with decreasing initial SMT concentration. The degradation of SMT by the UV/H2O2 process in a large photoreactor exhibited pseudo-first-order kinetics. Moreover, SO42− and NO3− did not retard the degradation of SMT but Cl− slightly inhibited the degradation of SMT. SMT was completely degraded in 10 min by the UV-254 nm/H2O2 process at an initial SMT concentration of 5 mg/L and an initial H2O2 concentration of 10 mM in the absence of anions. These results clearly reveal the potential of the UV/H2O2 process in a large photoreactor in the effective degradation of SMT in aqueous solutions.
Published Version
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