Abstract
Far ultraviolet (FUV) reflectance measurements on in situ deposited MgF2-overcoated aluminum films and on the same films after exposure to controlled doses of air show that a reflectance degradation up to 10% takes place due to exposure. We applied increasing doses of molecular nitrogen, molecular oxygen and water vapor in order to identify the components of the atmosphere which are responsible for the variation mentioned above. Results show that doses larger than 104 L of both molecular oxygen and water vapor produce a reflectance decrease. On the other hand molecular nitrogen doses up to 106 L do not modify reflectance at all. Additional FUV transmittance measurements on MgF2 films deposited onto crystalline MgF2 substrates also showed a degradation behavior under similar gas exposures.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.