Abstract
This paper reports on the fabrication of two-dimensional macropore arrays by electrochemical etching of silicon. We describe some critical effects accompanying the etching process that can generate imperfections in the etched pore pattern. We also give the solutions to improve the pore uniformity and to produce high-aspect-ratio macropores with good structural characteristics. The obtained macroporous structures can be further processed to produce high-aspect-ratio pillars, instead of pores. By modulating the applied etching current we have also induced periodicity in the third dimension. (© 2005 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim)
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