Abstract
• A novel HfZrC/HfZrCN/HfZrON/HfZrO based solar absorber tandem stack was developed by reactive magnetron sputtering using a single HfZr target. • High spectral selectivity was achieved with a high absorptance of 0.947 in the solar region and low emissivity of 0.14 in the IR region. • The tandem stack was thermally stable up to 500 °C in a vacuum environment. A novel HfZrC/HfZrCN/HfZrON/HfZrO based solar absorber tandem stack was successfully deposited on silicon and stainless steel (SS) substrates by pulsed DC reactive magnetron sputtering using an alloy target of HfZr. The optimized tandem stack was fabricated by varying the deposition parameters like reactive gas flow rates (C 2 H 2 , N 2, and O 2 ), sputtering power, and deposition time. X-ray diffraction and X-ray photoelectron spectroscopic methods were used to determine the structural and chemical compositions present in the optimized tandem coatings. In the tandem stack, HfZrC, HfZrCN and HfZrON/HfZrO layers act as a main absorber layer, a semi-absorber layer and double layer anti-reflection in the coating structure. The high spectral selectivity was achieved by optimizing the individual layers in the tandem stack, which exhibits 0.947 of optical absorptance in the solar region and 0.14 of low emissivity in the IR region. The optimized tandem stack is stable up to a temperature of 500 °C in a vacuum environment. The present investigation demonstrates that the developed HfZrC/HfZrCN/HfZrON/HfZrO tandem stack exhibited high solar spectral selectivity and good thermal stability, thus it can be used in high-temperature solar concentrated power applications.
Published Version
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