Abstract
Reactive sputtering is a very useful technique, particularly, for producing inhomogeneous interference filters, where the refractive index changes smoothly during deposition. In such a context, precise control of deposition parameters is crucial for replicating the desired optical properties. This study employed a pulsed DC power source to investigate the influence of a duty cycle on target poisoning, sputtering plasma characteristics, electric signals, and optical and morphological properties of synthesized films. Reactive pulsed DC magnetron sputtering was characterized by analyzing the behavior of plasma emission via optical emission spectroscopy and voltage-current signals, while modulating parameters such as the oxygen content within the vacuum chamber. A set of thin films was coated on glass substrates under different system conditions. These films underwent characterization employing spectroscopic ellipsometry to ascertain their optical constants, atomic force microscopy for surface morphology analysis, and x-ray diffraction for the determination of crystalline structures. The results indicate that longer duty cycles required higher oxygen levels to poison the target. Additionally, a detailed analysis of electrical signals revealed nonsquare waveforms, whose characteristics were influenced by both the duty cycle and the oxygen content within the sputtering chamber, resulting in higher effective voltages during the on-time of the voltage pulse. Grown films via reactive pulsed DC magnetron sputtering were also compared to films grown via conventional DC magnetron sputtering at equivalent conditions of target poisoning.
Published Version
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
