Abstract

Nanoscale textured surfaces play an important role in creating antibacterial surfaces, broadband anti-reflective properties, and super-hydrophobicity in many technological systems. Creating nanoscale oxide textures on polymer substrates for applications such as ophthalmic lenses and flexible electronics imposes additional challenges over conventional nanofabrication processes since polymer substrates are typically temperature-sensitive and chemically reactive. In this study, we investigated and developed nanofabrication methodologies to create highly ordered oxide nanostructures on top of polymer substrates without any lithography process. We developed suitable block copolymer self-assembly, sequential infiltration synthesis (SIS), and reactive ion etching (RIE) for processes on polymer substrates. Importantly, to prevent damage to the temperature-sensitive polymer and polymer/oxide interface, we developed the process to be entirely performed at low temperatures, that is, below 80 °C, using a combination of UV crosslinking, solvent annealing, and modified SIS and RIE processes. In addition, we developed a substrate passivation process to overcome reactivity between the polymer substrate and the SIS precursors as well as a high precision RIE process to enable deep etching into the thermally insulated substrate. These methodologies widen the possibilities of nanofabrication on polymers.

Highlights

  • Oxide nanoscale structures play a central role in optical, electrical, and biomedical nanotechnological devices and sensors due to their tunable optoelectronic properties, high surface-to-volume ratio, and good stability [1,2]

  • Surface texturing with high-aspect-ratio oxide nanostructures significantly enhances surface-based properties in sensors [3,4], antibacterial surfaces [5,6], hydrophobic surfaces [7], and optical lenses [8,9]

  • Oxide surface texturing has been demonstrated by several nanostructure formations and patterning techniques, including photolithography [10], nanoimprint lithography [11,12], colloid assembly [13,14], and mesoporous silica layers [15]

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Summary

Introduction

Oxide nanoscale structures play a central role in optical, electrical, and biomedical nanotechnological devices and sensors due to their tunable optoelectronic properties, high surface-to-volume ratio, and good stability [1,2]. Surface texturing with high-aspect-ratio oxide nanostructures significantly enhances surface-based properties in sensors [3,4], antibacterial surfaces [5,6], hydrophobic surfaces [7], and optical lenses [8,9]. A high-aspect-ratio oxide nanostructure can enhance properties such as light transmission and surface hydrophobicity as well as act as an antireflective layer due to the low effective refractive index of the metal oxide/air sub-wavelength nanostructure [11]. If the nanostructure is designed to create an effective refractive index gradient, it can exhibit wide angular broadband anti-reflective behavior, such as moth eyes exhibit in nature and as has been mimicked by several man-made approaches [12,16,17,18,19,20,21,22,23].

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