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Abstract
An antireflection moth-eye structure was fabricated on a glass substrate by ultraviolet nanoimprint lithography (UV-NIL). A Ni template with an artificial conical structure was fabricated by laser interference lithography an used as a stamp for embossing. A transparent PVC template was fabricated by hot embossing. The embossed poly(vinyl chloride) (PVC) film was then used as an imprint template after depositing SiO2 and a self-assembled monolayer (SAM). Using the embossed PVC film as a UV-NIL stamp, a polymer based moth-eye structure was formed on the glass template and its transmittance, parallel to surface normal, was increased to 93% for a single side patterned and 97% for a double side patterned. However, at wavelengths shorter than 430 nm, the transmittance of 30°-rotated glass substrate with a moth-eye structure became lower than that of the bare glass substrate, while the transmittance was not changed for longer wavelength regions.
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