Abstract
An extremely promising complete nanofabrication process of metallic patterns, to achieve periodic structure resolution well below 100 nm, has been successfully demonstrated. The process includes the EUV patterning encoding on the photoresist and its transfer from the polymer onto a Si substrate using a 46.9 nm table top soft x-ray laser and an interference lithography scheme. After optimizing the PMMA—poly(methyl methacrylate)—preparation thickness and development, by controlling the metal deposition and subsequent liftoff process on the exposed PMMA/SiO2/Si(1 0 0) samples, we have fabricated large arrays of 200 nm spaced nickel strips on Si surfaces.
Published Version
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