Abstract
A novel process for fabricating high-density and high diffraction efficiency inorganic gratings has been proposed by combining laser interference and chemical etching. In the present work, UV photosensitive Zr-contained sol was synthesized, and photosensitive ZrO2/BzAc gel films on (100) silicon were prepared using the sol-gel method. Subsequently, inorganic film gratings with a pitch of 1 μm were fabricated by laser interference in this photosensitive gel film combining with the process of heat treatment. In order to increase the depth-to-width ratio of the gratings, chemical etching was adopted by using iodine-saturated KOH as anisotropic etchant, which improved the diffraction efficiency of the gratings effectively. Furthermore, the diffraction efficiency was improved by gold coating to enhance the surface glossiness and reflection coefficient.
Published Version
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