Fabrication of frequency selective metamaterial structure using low-cost laser writer

Abstract

Tailoring the metamaterial structure using Laser writer lithography system offers a feasible way to accomplish the fine cross grating structures. The main focus of this work is to fabricate a metamaterial for absorption in the far infrared (far-IR) spectrum. Fabrication was carried out using homemade laser writer working at 405 nm in S1813 photoresist coated upon chromium on glass followed by its etching in the exposed regions. A 40 × 40 array of unit cells with dimension in the order of 28 μm ± 1 μm were achieved. The structural characterization was carried out using scanning electron microscope (SEM) and Optical Microscope. We could observe clear absorption in the far-IR region. The results here would be favorable for the development of devices based on artificial material whose properties are not readily accessible in nature (metamaterials).