Abstract
Two fluorine-doped diamond-like carbon (F-DLC) stamps with sub-100 nm line patternswere fabricated using a direct etching method. These were applied successfully toultraviolet (UV) nanoimprint lithography without requiring an anti-adhesion layer coating.Tests were performed to determine the optimum fluorine concentration for the F-DLCstamps. The ideal stamp material consisted of 25 at.% F-DLC with a contact angle of85°, UV transmittance of 16.4–26.8%, and hardness of 4.5 GPa. TheO2 plasma etch rate of the DLC was increased considerably by the fluorine doping,making it comparable to the etch rate of polymethyl methacrylate (PMMA).Thus, only PMMA was used as the etch mask in the fabrication of the stamps.
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