Fabrication of Ferroelectric Microstructures by Electron-Beam-Induced Patterning Process

Abstract

300 nm to 20 μm-sized circular dots of SrBi2Ta2O9 (SBT), lead-free ferroelectric materials, were fabricated by an electron-beam-induced micropatterning process using a scanning electron microscope (SEM)-based electron beam lithography system. The obtained micro dots were characterized using optical microscopy and atomic force microscopy. We also succeeded in fabrication of 2 to 20 μm diameter Ir/SBT/Ir circular capacitors employing a lift-off technique in the electron-beam-induced patterning process. Those circular capacitors showed piezoelectric response.