Abstract
In this article, we report a new lift-off process to fabricate Au microelectrodes with photopolymerization of 6-diallylamino-[1,3,5]triazine-2,4-dithiol (DA) thin films, which is easier, more energy saving, and friendlier to the environment than the past processes. The optimum conditions for fabricating fine Au/poly(DA) microelectrodes are as follows: DA film thickness is 40 nm and UV irradiation time is 20 min. The Au/poly(DA) microelectrodes with over 10 µm spaces were developed and could be well applied to pentacene thin-film transistors with a mobility of 1.3×10-1 cm2 V-1 s-1 and a threshold voltage of -13.4 V.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
