Abstract
A planarization technique has been developed to embed in a very thin (<20nm) transparent layer a sub-wavelength hole grating patterned in an amorphous silicon layer on a glass substrate. Such an embedded high-index grating is of interest for far-field imaging of biological cells through sub-diffraction optical probing. Obtaining a planar surface is mandatory to get observation conditions similar to those with usual microscopy bare glass coverslips. The bio-compatibility of the embedding material has been successfully assessed.
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