Experimental Study and Influence Mechanism of the Properties of α-C:H Thin Film at Different Bias Voltages

Abstract

Amorphous hydrogenated carbon (α-C:H) thin films were deposited by the linear ion source (LIS)-physical vapor deposition (PVD) at the bias voltages ranging from 0V to-1500V. The characteristics such as surface topography and mechanism properties of the film were investigated under the voltage of 0V, -500V, -1000V and-1500V by using atomic force microscope (AFM), Ball Mills and Rockwell Indentation Tester. The results showed that with the increase of the bias voltage, the surface roughness of the film decreased initially and then increased. The wear resistance and compressive property were continuously improved. When the bias voltage was-1000V, the surface roughness was the lowest of 5.78nm.When the bias voltage went to-1500V, the film had the lowest wear rate of 7.8E-8 and the best compressive property. As a result, deeply understanding the effect mechanism of the bias voltage on α-C:H thin film is meaningful for the future deposition.