Abstract
Physical evaporation of SiO and SiO(2) under ultra-high vacuum conditions was monitored in situ with infrared spectroscopy at frequencies between 450 cm(-1) and 5000 cm(-1). The measured vibrational spectra of the condensed films are identical in both cases, for SiO and SiO(2) evaporation, and can be described with four Brendel oscillators located at 380 cm(-1), 713 cm(-1), 982 cm(-1), and 1101 cm(-1), corresponding to typical vibration modes in SiO.
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