Abstract

We compared the absolute flux of positive ions with the flux of photons in a vacuum ultraviolet (VUV) wavelength range in an electron cyclotron resonance hydrogen plasma. The absolute flux of positive ions was measured using a Langmuir probe. The absolute flux of VUV photons was evaluated on the basis of the branching ratio between the Lyman and Balmer lines emitted from electronic states with the same principal quantum numbers. The absolute intensities of the Balmer lines were obtained by calibrating the sensitivity of the spectroscopic system using a tungsten standard lamp. It has been found that the flux of VUV photons is, at least, on the comparable order of magnitude with the positive ion flux, suggesting the importance of VUV photons in plasma-induced damage in fabrication processes of ultralarge-scale integrated circuits.

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