Abstract
Copper nanowires (Cu NWs) are promising materials for transparent electrode applications. However, their growth mechanism during water-based synthesis remains unclear. The steric hindrance of a surfactant, which has been considered in previous studies, is insufficient to explain the suppression of Cu oxide formation during water-based synthesis. In this paper, we suggest that ethylenediamine (EDA, C2H4(NH2)2), which is commonly used as a structure-directing agent (SDA), may play an important role as an oxidation inhibitor in water-based synthesis of Cu NWs. High-resolution transmission electron microscopy (HR-TEM) analysis indicated that the Cu NWs grow from icosahedral seeds. Additionally, energy-dispersive X-ray spectroscopy (EDS) and X-ray photoelectron spectroscopy (XPS) suggested that EDA affects the oxidation state of the as-prepared Cu NW surface. Finally, density functional theory (DFT) calculations revealed that the adsorption of EDA effectively hinders the adsorption of oxidizing species and pre...
Published Version
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