Abstract
Possibilities and results of using relief structures produced by anisotropic etching as etalons for linear measurements in nanorange are discussed. Two types of the structures with different profiles and with two approaches to estimation of influence of its sophistication degree on measurement results are considered. Analyze of methods and means of measurements of its geometric parameters and comparison of uncertainness of measurement results are conducted. The important condition for diminishing the measurements uncertainness is taking into account irregularities of a sample surface. These irregularities were evaluated by TEM and CD-AFM. Results of harnessing these types of structures are different also. The bureau International des Poids et Mesures recommended the structure with rectangular profile and its attestation procedure as an example for all national committees on linewidth metrology in nanorange. The structure with trapezoid profile that induced hopes for decision of basic tasks of nanometrology in past is occurred to be poorly in demand even on national scale.
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