Abstract
A holographic lithography method for fabricating large-scale photonic phased array is presented. The large-scale array could be gen- erated using a specially designed holographic optical element and the period could be decreased by half with the help of a half-wave plate. This method provides a convenient way to obtain the photonic array with a smaller period without shortening the recording wavelength. MATLAB simulations and primary experimental results have demonstrated that the phase modulation and nonlinear photoresist response played collectively significant roles in tuning the distribution of the array. The large-scale photonic phased array with a smaller period is an ideal candidate as a Raman substrate. © 2013 Society of Photo-Optical Instrumentation
Highlights
Photonic crystals (PhCs) are artificial crystals specially made for applications[1] in visible and near-infrared spectral regions
Holographic lithography (HL)[7] attracts intense attention since multibeam interference can form almost all basic Bravais lattices[8] and the periodic lattice patterns can be fabricated into photosensitive materials quickly with low cost
The photonic array with an improved ordering degree and the smaller period obtained in our work could produce an ideal candidate as a Raman substrate
Summary
Photonic crystals (PhCs) are artificial crystals specially made for applications[1] in visible and near-infrared spectral regions. 52(9), 095103 (Sep. 2013)] has been revised by the authors to include two additional references and explanatory text. This erratum includes the revised introduction and the updated references.
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