Abstract
Sputtering techniques were used to deposit thick refractory metal and alloy coatings inside rifled tubes 30 mm in diameter and up to 60 cm in length. An extended source, in the form of a negatively biased coaxial central rod composed of the coating material, ensures uniform coverage of the substrate. The application of a negative bias to the tube increases the intensity of the source glow discharge. Examination of tungsten and tantalum coatings showed that poor adhesion is due to the formation of a brittle iron oxide layer during sputter cleaning. The dependence of the columnar coating morphology on the intensity of the substrate glow discharge is illustrated by a variation in the grain size between the land and groove of the rifling. Radiusing the land corners improves both the coverage on the land side and the growth morphology. A range of Ta-W alloy coatings were deposited and these exhibit a particulate growth morphology.
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