Abstract
We deal with solid parallel-plate UV-based nanoimprint lithography (UV-NIL) using rigid quartz stamps and spin coated substrates. Achieving a conformal contact of stamp and substrate in a parallel-plate setup is challenging, since the solid stamp and the substrate usually are not perfectly flat. Finite element simulations and experimental results show that a correctly designed compliant layer underneath the substrate guarantees a conformal contact of stamp and substrate and therefore imprints of a high quality with a homogeneous and thin residual layer down to 10nm can be achieved.
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