Enhancing dispersion stability and recyclability of ceria slurry with polyacrylic acid for improved glass polishing performance

Abstract

This study aimed to enhance both the dispersion stability and recyclability of micron-sized ceria slurry in glass polishing by incorporating polyacrylic acid (PAA). PAA with a molecular weight of 240 k was very effective as a dispersant for ceria slurry due to its unique surface adsorption and its characteristics as an anionic polyelectrolyte. Using a 240 k-PAA concentration of 1.0 wt% led to significant improvements in polishing performances, as demonstrated by consistent glass removal rates across recycling cycles. Additionally, the study investigated the physico-chemical properties of polishing slurries, such as specific gravity, particle size, zeta potential, and pH. These properties were effectively maintained with the use of PAA as the dispersant, particularly when KOH was used as a pH adjuster. A 100 µm bag-type filtration system was also introduced for handling the micron-sized ceria slurry, highlighting its practical benefits in slurry management. In conclusion, employing 240 k-PAA as a dispersant in micron-sized ceria slurries for Gorilla glass polishing not only maintains quality and stability across recycling cycles but also provides notable economic advantages by enabling the recycling of the slurry.