Abstract
Mask less surface plasmon interference lithography provides potential to obtain nanoscale feature size with large area at low cost. In this paper, we present a novel structure for mask less surface plasmon interference lithography. It is an enhanced Kretschmann structure in which a dielectric layer with low refractive index is added between the prism and metal layer. Numerical results show that the additional dielectric layer eliminates the inherent limit in classic Kretschmann structure that requires use of a prism with high refractive index for lithography purpose. Also, the structure exhibits more flexibility in tuning the spatial resolutions than classic Kretschmann structure. Both advantages lead to the structure more practical in real use.
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