Coupled surface plasmon interference lithography based on a metal-bounded dielectric structure

Abstract

We propose a coupled surface plasmon (SP) interference lithography based on a metal-bounded dielectric structure. The long and short range SP interferences at different dielectric thicknesses in the structure are analyzed. The interference in Kretschmann structure under the same conditions is also compared. Numerical results show the coupled SP interference offers better lithography performance as compared with the Kretschmann SP interference. This proposed technique provides potential for fabrication of periodic nanostructures.