Abstract
In the PVD processes, the clearance of the chamber wall directly affects the microstructure and surface properties of the coatings. The (Ti,AlCr)N coatings are fabricated on M2 high-speed steel (HSS) and Si (100) by cathodic arc evaporation with the vacuum chamber cleaned or uncleaned. With the chamber cleaned, the arc discharge was enhanced with a higher intensity of optical spectrum and the concentration of residual oxygen was decreased. The clearance of chamber wall altered the external behavior of power supply and a larger input power was achieved. The average substrate ion current was increased by 13.0% and a larger Ebi was observed implying increased densification of coatings. A thicker coating was obtained with less surface defects (macroparticles). Consequently the microstructure and surface properties of (Ti,AlCr)N coatings have been improved with higher hardness, lower friction coefficient and superior adhesion strength between the coatings and substrate.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.