Elektronenmikroskopischer kontrast kleiner fehlstellenagglomerate in ionenbestrahltem kupfer

Abstract

Abstract ELECTROS MICROSCOPY CONTRAST OF SMALL DEFECT CLUSTERS IN ION–IRRADIATED COPPER Systematic investigations were performed on the dependence of the contrast of small vacancy agglomerates, interstitial agglomerates and gas bubbles on TEM imaging conditions. The studies were made on copper foils bombarded with 5 keV argon ions. Agglomerates with diameters of 1–2 nm were most easily visible under dynamical dark–field conditions. Exceptions to the regular contrast behaviour were detected in very thin regions of the specimen (i.e. a reversal of the direction of tho black-white contrasts). The different experimental observations arc discussed critically and hints are given on the practical imaging of small defect agglomerates.