Abstract
Effect of post annealing temperature on electronic properties of Ga-In-Zn-O (GIZO) have quantitatively studied by using reflection electron energy loss spectroscopy (REELS), x-ray photoelectron spectroscopy (XPS), and x-ray absorption fine structure (XAFS) spectra. The band gap values of GIZO are 3.1 eV, 3.5 eV, and 3.8 eV, at room temperature (as deposited), post-annealing at 600 °C, and 700 °C, respectively. The composition of Ga increased and Zn reduced with increasing post-annealing temperature. The formation of Ga-(Ga,Zn) and Zn-(Zn,Ga) bonds in GIZO thin film annealed at 700 °C was confirmed by XAFS study. The electronic properties of GIZO thin films strongly affected by the bonding formation of Zn-O and Ga-O as the effect of annealing temperature.
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