Electrodeposited CdS on CIS pn junctions

Abstract

We have been investigating the electrochemical deposition of thin films and junctions of cadmium sulfide (CdS) and copper indium diselenide (CIS). We show that it is possible to fabricate pn junctions based on n-type CdS and p-type CIS entirely by electrodeposition. CIS is considered to be one of the best absorber materials for use in polycrystalline thin-film photovoltaic solar cells. CdS provides a closely lattice-matched window layer for CIS. Electrodeposition is a simple and inexpensive method for producing thin-film CdS and CIS. We have produced both p- and n-type CIS thin films, as well as a CdS on CIS pn junction via electrodeposition. Elemental analysis of the CdS and CIS thin films was performed using X-ray photoelectron spectroscopy and energy dispersive spectroscopy. Optical band gaps were determined for these films using optical transmission spectroscopy. Carrier densities of the CIS films as a function of their deposition voltage were determined from capacitance vs. voltage measurements using Al Schottky barriers. Current vs. voltage characteristics were measured for the Al on CIS Schottky barriers and for the CdS on CIS pn junction.