Abstract
The article is concerned with the investigation of techniques of post-treatment of porous silicon. It was shown that the applied techniques have considerable effect on por-Si nanowires shell without a considerable influencing on their core. To study the features of changing the phase composition and the composition of chemical bonds of the surface of porous silicon, we used infrared spectroscopy, Ultrasoft X-Ray Spectroscopy and photoluminescence spectroscopy.
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