Effects of Annealing Process on the WO3 Thin Films Prepared by Pulsed Laser Deposition

Abstract

This work presents a study of the effect of annealing temperature on the optical and structural properties of WO3 that has been deposited by Pulsed Laser Deposition (PLD) method at 300°C on the rules of glass and indicates the effect of annealing temperatures 350, 450 and 550°C for one hour on those properties. The results of X-Ray diffraction showed all the films prepared with the installation of multi-crystalline tetragonal and directional prevalent (010) for all models after annealing. The annealing led to an increase in the grain size. Full width at half maximum FWHM values of the (010) peaks of these films decreased from 1.492° to 1.064° with increasing annealing temperature, and the highest value of the specific surface area was 63 m2/gm. The natural structure of the WO3 nanoparticles films were studied by using field emission scanning electron microscopy (FESEM), it revealed that the average grain size increased with increasing of annealing temperature from 46.57 to 485.1nm. The optical features of the films were studied by Photoluminescence PL, the results gave one emission peaks located at 437 nm, and there was a red shift when the annealing temperatures were increased.